| Author | Kin P. Cheung , K. P. Cheung |
| Format | Hardcover |
| ISBN | 9781852331443 |
| Publisher | Springer London Ltd |
| Manufacturer | Springer London Ltd |
Provides a comprehensive coverage of the subject of plasma charging damage in VLSI circuit manufacturing. This book includes information on plasma and mechanisms of plasma damage; wear-out and breakdown of thin gate-oxides; the impact of processing equipment on damage; methods of damage measurement; damage management; and gate-oxide scaling.
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